Tuesday 29 October 2013

Bentham Science eBooks: Ion Implantation and Activation, Volume 2

Bentham Science offers various e-books which cover all major areas of technology, natural science, humanities and medicine. Flexible publication solutions have been supplied to the authors by Bentham e-book. These electronic books are rapidly published using state-of-the-art internet technology.
Here is the review of one of the recent e-books of Bentham, “Ion Implantation and Activation-Volume 2”. This e-book presents the derivation process of related models in a comprehensive step by step manner starting from the fundamental processes and moving up into the more advanced theories.
Ion implantation can be expressed theoretically as a binary collision, and, experimentally using various mathematical functions. Readers can understand how to establish an ion implantation database by combining theory and experimental data. The models described in this eBook can be directly related to practical experimental data with various approaches: physical, empirical or experimental. Readers can also understand the approximations, and assumptions to reach these models. Chapters in the book explain, in depth, various topics such as Pearson functions, LSS theory, Monte Carlo simulations, Edgeworth Polynomials and much more.
This book provides advanced engineering and physics students and researchers with complete and coherent coverage of modern semiconductor process modeling. Readers can also benefit from this volume by acquiring the necessary information to improve contemporary process models by themselves.
To read more about this e-book, you can visit:

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